Manufacturing photonic devices with periodic structures requires a high-volume, low-cost lithography solution that can print the necessary patterns with high accuracy and fidelity. Displacement Talbot Lithography (DTL) has emerged as one of the main contenders for this challenging task. DTL enables reproducible patterning of highly precise and defect-free gratings with large, seamless exposure fields and with the required resolution and quality. As an optical lithography technology, DTL relies on industry standard exposure concepts, materials and resources such as photoresists, lasers and photomasks. Application of this lithography technology to specific needs of photonics applications such as AR waveguides, DFB/VCSEL lasers or meta materials like wiregrid polarizers and examples from its real life implementation will be presented.

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Bio

Harun Solak received his Ph.D. in Electrical Engineering from the University of Wisconsin-Madison. After a postdoctoral appointment at the same university he joined the Paul Scherrer Institute in Switzerland. He set up and managed world’s first EUV interference lithography systems at synchrotron radiation facilities at the UW-Madison and later at the PSI. He is the CEO and cofounder of Eulitha AG that develops and commercializes new lithography technologies. He has authored more than one hundred technical papers and seventy patents.